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which is commonly applied in both applications
but with advanced technologies
This Specification covers the characteristics specific to attenuated phase shift masks and mask blanks
Method A is destructive and is limited to inspection of discrete points on the periphery
and packaging prior to transport
P04100 - SEMI P41 - XMLによる，検査装置，修正装置およびレビュー装置間で取扱うマスク欠陥データ仕様 Revision:SEMI P41-0304E - Inactive which is commonly applied inNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeJapanese Micropatterning Committee2009Japanese Regional Standards Committee20042www. semi. org20043 E 2004923 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to
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