MF072800 - SEMI MF728 - Practice for Preparing an Optical Microscope for Dimensional Measurements Revision:SEMI MF728-81 (Reapproved 2003) - Superseded It may be applied to

It may be applied to subsystems of other multi-resource equipment

It does not apply to scatter from translucent or transparent materials

SEMI D20 — Terminology for FPD Mask Defect

SEMI MF84-0307 (technical revision)

The test is intended to accelerate the corrosion while simulating conditions that may be found within process equipment and gas systems in the semiconductor industry

MF072800 - SEMI MF728 - Practice for Preparing an Optical Microscope for Dimensional Measurements Revision:SEMI MF728-81 (Reapproved 2003) - Superseded It may be applied toDimensional measurements made with an optical microscope are made on the optical image of the specimen and not directly on the specimen itself. The method of illuminating the specimen affects the image content, including the appearance of edges which are used in defining the size of the specimen. This Practice includes adjusting the microscope for Kohler illumination, which provides uniform illumination of the specimen, reduces stray light, and