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SEMI T3-0302 (technical revision)
where applicable
本スタンダードは，半導体産業およびその関連産業向け装置の操作，保守，および修理を問題なく遂行するための能力，作業，技能，および知識に関連付けることができる技術トレーニング階層の明確化および分類の枠組みを記述する。
NOTICE: This Standard was balloted and approved for withdrawal in 2022
2 Knowledge of these characteristics can help the producer and consumer determine if the dimensional characteristics of a specimen wafer satisfy given geometrical requirements
P02600 - SEMI P26 - Parameter Checklist for Photoresist Sensitivity Measurement Revision:SEMI P26-0703 - Inactive SEMI T3-0302 (technical revision)This checklist was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on April 28, 2003. Initially available at www. semi. org June 2003; to be published July 2003. Originally published in 1996. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain
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