F09800 - SEMI F98 - Guide for Treatment of Reuse Water in Semiconductor Processing Revision:SEMI F98-0326 - Current 1) and requirements for securing

1) and requirements for securing the interface between container and processing equipment or wafer transportation equipment

X-Ray Diffraction Orientation — This test method may be used for the orientation of all semiconductive single crystals

and important electrical parameters such as delivered power

Standardized scan patterns for both local and full-area surface characterization

1 (for 300 mm wafers)

F09800 - SEMI F98 - Guide for Treatment of Reuse Water in Semiconductor Processing Revision:SEMI F98-0326 - Current 1) and requirements for securing* This Standard has the option to purchase the Current document with a redline document (Current + Redline). The redline document is included with the Current document as a comparison tool to help identify changes that have been made between the Current version and the previous version (Superseded). If differences should exist between the redline document and the Current document, the Current version is the official and authoritative version. 1