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tetrakis(diethylamino) hafnium and tetrakis(ethylmethylamino) hafnium which are used in the semiconductor industry for the deposition of hafnium oxide based layers by atomic layer deposition
bias power)
and Safety Guideline for FPD Manufacturing Systems
SEMI MF1048-0217 (technical revision)
本基準係在針對半導體產業使用的生產設備提供以設計為主的整套電氣安全考量。
F00600 - SEMI F6 - 危険ガス配管システムの二次封じ込め（ガイドライン） StdDcs-Current tetrakis(diethylamino) hafnium and tetrakis(ethylmethylamino) hafniumHPM Uniform Building CodeH 6Uniform Fire Code5180 Referenced SEMI Standards SEMI F1 Specification for Leak Integrity of Toxic Gas Piping Systems SEMI S2 Safety Guidelines for Semiconductor Manufacturing Equipment SEMI S4 Safety Guideline for the Segregation Separation of Gas Cylinders Contained in Cabinets
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