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• A description of information and control functions needed in a semiconductor manufacturing environment
300 mmオープンカセット （SEMI E1
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org in October 2016
2 Although it was developed primarily for use in calibration of SSISs to be used for detection of LLSs on polished silicon wafers with geometrical characteristics as specified in SEMI M1
D08400 - SEMI D84 - Terminology for FPD Phase Shift Mask and Mask Blanks StdPbc-1225 • A description of informationThis Standard defines the terminology for FPD phase shift masks and mask blanks. This Standard applies to phase shift masks and mask blanks that are principally used in fabricating flat panel displays. Referenced SEMI Standards (purchase separately) None. Revision History SEMI D84 0823 (first published)
