M01700 - SEMI M17 - Guide for a Universal Wafer Grid StdPbc-1113 3 In order to enhance

3  In order to enhance the clarity and applicability of the Document

SEMI E80-0299 (Reapproved 1104)

orgで入手可能となる。初版は1995年発行。前版は2005年11月発行。

brightness enhanced films

This has been done to establish a base for SMIF port standardization

M01700 - SEMI M17 - Guide for a Universal Wafer Grid StdPbc-1113 3 In order to enhanceMaximum allowable slip and other non uniformly distributed defects are frequently specified when procuring polished and epitaxial silicon wafers. SEMI M62 specifies a maximum allowable fraction of the epitaxial wafer surface area that can contain slip. This Guide provides a design for and guidance for use of a wafer grid that facilitates the determination of the fraction of the wafer surface area covered by observed defects. This Guide defines a grid