P00100 - SEMI P1 - ハードサーフェス・フォトマスク用基板 StdPbc-0611 other test methods are required

other test methods are required to cover the measurement of minority carrier diffusion lengths in specimens of extrinsic single-crystal semiconducting materials or in homoepitaxial layers of known resistivity deposited on more heavily doped substrates of the same type

24 Ω·cm to about 330 Ω·cm in p-type wafers)

This Safety Guideline defines a process and specific criteria for risk estimation

本試験方法は，Facilities Committeeで技術的に承認されたもので，North American Facilities Committeeが直接責任を負うものである。現版は1998年10月North American Regional Standards Committeeにて承認された。1999年2月にまずSEMI On Lineで入手可能になり，1999年2月発行に至る。初版は1992発行。

and displays

P00100 - SEMI P1 - ハードサーフェス・フォトマスク用基板 StdPbc-0611 other test methods are requiredNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI global Micropatterning Committee2008513global Audits and Reviews Subcommittee20086www. semi. org1981200111 E 20096A1 1 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status