P02200 - SEMI P22 - Guideline for Photomask Defect Classification and Size Definition Revision:'- Superseded and estimation of the variation

and estimation of the variation in thickness across the wafer for both flatted and notched wafers

4-0998E (Reapproved 0709)

originally published November 2007

3-0600 (technical revision)

and also make reserves extra time for SR test due to capacitance effect

P02200 - SEMI P22 - Guideline for Photomask Defect Classification and Size Definition Revision:'- Superseded and estimation of the variationNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. The purpose of this guideline is to establish standard nomenclature for photomask defect classifications, and to define defect sizing methods. Within this Document only the word photomask will be used, but it is meant to be