P02200 - SEMI P22 - フォトマスク欠陥の分類とサイズ定義についてのガイドライン Revision:SEMI P22-0307 - Inactive This Standard extends to the

This Standard extends to the region of ultra-thin thickness from 3 point bending measurement method SEMI G86-0303 which describes the Die Strength Evaluation Method

or mounting attitudes

SEMI F98-0326 (technical revision)

This Test Method covers the determination of the interstitial oxygen content of single crystal silicon by measurement of an infrared absorption band at room temperature

Changes were made to Section 1

P02200 - SEMI P22 - フォトマスク欠陥の分類とサイズ定義についてのガイドライン Revision:SEMI P22-0307 - Inactive This Standard extends to theNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI CurrentInactiveInactiveSEMI Referenced SEMI Standards (purchase separately) None.