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E04701 - SEMI E47.1 - 300 mmウェーハ搬送および保管用FOUPの機械仕様 Revision:SEMI E47.1-1106 (Reapproved 0512) - Inactive It may be applied to

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It may be applied to subsystems of other multi-resource equipment

This edition was approved for publication by the global Audits & Reviews Subcommittee on August 27

This Test Method covers the measurement by ellipsometry of the thickness and refractive index of an insulator grown or deposited on a silicon substrate

Hydrogen chloride is shipped as a liquefied compressed gas stored under its own vapor pressure

A prerequisite for this is a means for uniquely identifying the individual wafers regarding their origin

E04701 - SEMI E47.1 - 300 mmウェーハ搬送および保管用FOUPの機械仕様 Revision:SEMI E47.1-1106 (Reapproved 0512) - Inactive It may be applied toNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Physical Interfaces & Carriers Global Technical Committee20121224global Audits and Reviews Subcommittee20125www. semiviews. org www. semi. org1997200611 NOTICE: This Standard or Safety Guideline has an Inactive Status because the

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