P02800 - SEMI P28 - Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture Revision:SEMI P28-96 - Superseded low leakage

low leakage

本方法において精度を計算する意義は，マスフローコントローラ（MFC）の1人のユーザが1つのプロセスにおいてある製造装置から別の装置へと移動すること，そしてプロセスコントロールをする間に1台の製造装置内でMFCを交換することを可能にすることにある。

SEMI HB8-0217 (first published)

The purpose of this document is to present a process for ion implantation

SEMI E116-0623 (technical revision)

P02800 - SEMI P28 - Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture Revision:SEMI P28-96 - Superseded low leakageThis standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on April 25, 2007. It was available at www. semi. org in June 2007. Originally published in 1996. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available