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SEMI MF1528 — Test Method for Measuring Boron Contamination in Heavily Doped n-Type Silicon Substrates by Secondary Ion Mass Spectrometry
The purpose of this Guide is to provide standard cost of ownership (COO) metrics for evaluating unit production cost effectiveness of gas delivery systems in the semiconductor and related industries
Such impurities may be introduced into the wafer during manufacture or during various processing steps
本スタンダードは，global Information & Control Committeeで技術的に承認されている。現版は2006年11月21日，global Audits and Reviews Subcommitteeにて発行が承認された。2007年2月にwww
SEMI M8-0307 (technical revision)
M06200 - SEMI M62 - シリコンエピタキシャルウェーハの仕様 StdPbc-0622 SEMI MF1528 — Test Methodglobal Silicon Wafer Committee200912global Audits and Reviews Subcommittee20092www. semi. org20093CD ROM200511200711 Referenced SEMI Standards SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers SEMI M17 Guide for a Universal Wafer Grid SEMI M18 Guider for Developing Specification Forms for Order Entry of Silicon Wafers SEMI M33 Test Method for the Determination of Residual Surface Contamination on Silicon Wafers by Means of Total
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