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SEMI F50-0200 (Reapproved 1108)
This Specification allows growth methods that include Czochralski (Cz) method
org in October 2005
and is limited to silicon with doping concentrations less than about 1 × 1017 atoms/cm3
Subassemblies
E07300 - SEMI E73 - 真空ポンプのインタフェースの仕様 － ドライポンプ StdPbc-1016 SEMI F50-0200 (Reapproved 1108)NOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Physical Interfaces & Carriers Global Technical Committee20121220global Audits and Reviews Subcommittee20134www. semiviews. org www. semi. org1998420073 NOTICE: This Standard or Safety Guideline has an Inactive Status because the
