F10900 - SEMI F109 - Guide for Heater Systems Requirements StdTpc-FPD Substrates 機械特性

機械特性

2009年10月に編集上の修正がなされた。¶¶ 7

which is used in the semiconductor industry for the deposition of aluminium metal by vapor deposition techniques and aluminium oxide based layers by atomic layer deposition

SEMI 3D7-0913 (first published)

This leads to high efforts to specify the communication structures between FPU and the FMCS

F10900 - SEMI F109 - Guide for Heater Systems Requirements StdTpc-FPD Substrates 機械特性This Standard was technically approved by the global Gases Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 24, 2011. Available at www. semiviews. org and www. semi. org in February 2012. The purpose of this Guide is to define a framework for documenting uniform heater system requirements. The intended use of this Document is to act as a generic form for heater system