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This Standard describes a Guide for analysis of virgin high-purity ion exchange (HPIX) resin suitable for use in ultrapure water (UPW) polish applications
This Document covers requirements for sulfur hexafluoride used in the semiconductor industry
to be published February 2000
org およびwww
It has been replaced by SEMI C97
C07800 - SEMI C78 - Test Method for Determining Roughness of Polymer Surfaces Used in Ultrapure Water and Liquid Chemical Distribution Systems by Atomic Force Microscopy StdTpc-Process Chemicals - Precursors This Standard describes a GuideThis Standard was technically approved by the Liquid Chemicals Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 17, 2018. Available at www. semiviews. org and www. semi. org in December 2018; originally published January 2013. NOTICE: This Document was reapproved with minor editorial changes. This Document provides a test method for determining the roughness of polymer
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