P02900 - SEMI P29 - 減衰型位相シフトマスク（ハーフトーン型位相シフトマスク）およびマスクブランクスに特有な特性の仕様 Revision:SEMI P29-1105 - Superseded 4 The Guide focuses on

4  The Guide focuses on general measurement techniques including infrared (IR) laser profiling

and analytical procedures for the gases listed in the index

but reacts violently with most organic materials

This Standard provides a means for independent manufacturers to produce equipment and/or hosts which can be connected without requiring specific knowledge of each other

トップカセットIDタグ領域（オプション）　（1）

P02900 - SEMI P29 - 減衰型位相シフトマスク（ハーフトーン型位相シフトマスク）およびマスクブランクスに特有な特性の仕様 Revision:SEMI P29-1105 - Superseded 4 The Guide focuses onglobal Micropatterning Committee200598global Audits and Reviews Subcommittee200510www. semi. org200511CD ROM19979 2005 Referenced SEMI Standards SEMI P1 Specification for Hard Surface Photomask Substrates SEMI P22 Guideline for Photomask Defect Classification and Size Definition