E01400 - SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool StdPbc-1213 This procedure applies only to

This procedure applies only to large scale bulk purifiers rated at greater than 50 liters-per-minute (LPM) flow rate

Czochralski technique or other controlled solidification methods

The guidelines address safety aspects of ergonomics engineering in the design of semiconductor manufacturing equipment

Therefore it is mandatory to operate the measurement system under statistical process control (SPC

This Document provides basic interface requirements for automated substrate handling

E01400 - SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool StdPbc-1213 This procedure applies only toNOTICE: This document was withdrawn in accordance with the Regulations Governing SEMI Standards in 2003. The purpose of this document is to provide a standardized methodology and detailed procedure for measuring the contamination performance of a particular process or tool in terms of the number and size distribution of particles added to a silicon wafer as a result of having been passed through that process tool. Referenced SEMI Standards SEMI M10