C05400 - SEMI C54 - Specification for Oxygen (O2) Revision:SEMI C54-0624 - Current NOTICE: This Document was balloted

NOTICE: This Document was balloted and approved for withdrawal in 2001

This standard does not purport to address safety issues

02グレード酸素バルク供給ガスに対するパーティクルの最大許容濃度を設定し，(2)その確認のための参照方法の記述である。

This Guide covers the shipping of 300 mm nominally diameter silicon wafers

The purpose of this Document is to provide specifications for phosphine (PH3) that are used in the semiconductor industry

C05400 - SEMI C54 - Specification for Oxygen (O2) Revision:SEMI C54-0624 - Current NOTICE: This Document was balloted1 Purpose 1. 1 This Standard provides a series of specifications for different grades of oxygen (O2) that are used in the semiconductor industry. 2 Scope 2. 1 This Specification covers requirements for all standard grades of oxygen used in the semiconductor industry. Referenced SEMI Standards (purchase separately) SEMI C3 Specification for Gases SEMI C3. 22 Standard for Oxygen (O2), 99. 5% Quality SEMI C3. 23 Standard for Oxygen (O2), 99. 98% Quality