Pay in 4 interest-free payments of $48.25 Learn more
Ships within 48 hours · Estimated delivery Aug 28 - Sep 2
SEMI E123-0703 (Reapproved 1109)
1 Purpose
Either method may be applied to sheet or bulk specimens
SEMI E10-92 (technical revision)
called the SECS Equipment Data Dictionary (SEDD)
M07800 - SEMI M78 - Guide for Determining Nanotopography of Unpatterned Silicon Wafers High Volume Manufacturing StdPbc-0524 SEMI E123-0703 (Reapproved 1109)Front surface wafer height variations over specified distances need to be properly controlled to assure that wafers are acceptable for selected process steps. Nanotopography parameters are included in the International Technology Roadmap for Semiconductors (ITRS) since 2003. Nanotopography on a wafer surface prior to chemical mechanical planarization (CMP) processes can result in variations of post CMP film thickness with potential negative
US$ 80.00
US$ 158.00
US$ 96.99
US$ 76.70
US$ 79.00
US$ 118.00
US$ 49.70
US$ 103.00
