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This Test Method covers the measurement by ellipsometry of the thickness and refractive index of an insulator grown or deposited on a silicon substrate
The limit of detection is determined by either the BLANK value or by count rate limitations
2 This Test Method is applicable to wafers 50 mm or larger in diameter
This edition was approved for publication by the global Audits and Reviews Subcommittee on December 4
When documenting SECS-II messages
S01400 - SEMI S14 - 半導體製造設備火災風險評估與降低之安全基準 Revision:SEMI S14-0309 - Superseded This Test Method covers theNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. : Referenced SEMI StandardsSEMI E10 Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and UtilizationSEMI E70 Guide for Tool Accommodation ProcessSEMI S2 Environmental, Health, and
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