P03000 - SEMI P30 - 寸法測定用走査型電子顕微鏡（CD-SEM）の目録発行の実施要領 Revision:SEMI P30-0997 (Reapproved 1104) - Inactive It is hereby mentioned that

It is hereby mentioned that a measured value (for example the mean

Current edition approved by the North American Regional Standards Committee on August 28

Reduction of surface metal contamination below a concentration in accordance with the ITRS road map is a key issue for silicon wafer quality for most of the leading-edge technology applications

SEMI E130-0618 (Reapproved 0723)

Use of the short baseline results in improved precision of the method

P03000 - SEMI P30 - 寸法測定用走査型電子顕微鏡（CD-SEM）の目録発行の実施要領 Revision:SEMI P30-0997 (Reapproved 1104) - Inactive It is hereby mentioned thatNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeJapanese Micropatterning Committee2004723Japanese Regional Standards Committee20049www. semi. org2004111997 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to