M01400 - SEMI M14 - Specification for Ion Implantation and Activation Process for Semi-Insulating Gallium Arsenide Single Crystals StdTpc-Mask and Mask Equipment 本スタンダードは， Physical Interfaces & Carriers

本スタンダードは， Physical Interfaces & Carriers Global Technical Committeeで技術的に承認されている。現版は2013年12月23日，global Audits and Reviews Subcommitteeにて発行が承認された。2014年3月にwww

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SEMI E56 — Test Method for Determining Accuracy

SEMI G23-0996 (Reapproved 0318)

SEMI S10-0423E (editorial revision)

M01400 - SEMI M14 - Specification for Ion Implantation and Activation Process for Semi-Insulating Gallium Arsenide Single Crystals StdTpc-Mask and Mask Equipment 本スタンダードは， Physical Interfaces & CarriersThe purpose of this document is to present a process for ion implantation, activation, and measurement of the resulting layers so that meaningful comparisons can be made between various lots of semi insulating GaAs. This test will be performed by the supplier so that product may be represented in a standard way. Referenced SEMI Standards None.