S00200 - SEMI S2 - 半導體製造設備安全衛生及環保基準 StdPbc-0319 5 This Test Method requires

5  This Test Method requires the use of three different kinds of particle distributions with specified characteristics and wafers that have surface characteristics adequate to allow detection of the smallest particles utilized with a capture rate of greater than 95%

SEMI M50-1116 (technical revision)

1  This Specification defines metrics and calculations for reporting equipment data quality

SEMI D62-0619 (technical revision)

is intended to reduce the cost of transporting wafers between IC manufacturing sites

S00200 - SEMI S2 - 半導體製造設備安全衛生及環保基準 StdPbc-0319 5 This Test Method requiresNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. Referenced SEMI Standards (purchase separately) SEMI E6 Guide for Semiconductor Equipment Installation DocumentationSEMI F5 Guide for Gaseous Effluent HandlingSEMI F14 Guide for the Design of Gas Source Equipment EnclosuresSEMI S1 Safety