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範圍（第2節）
The present focus of this Document is on feature-related metrology and measurands important for the definition and control of lithographic processes
3 The following groups of utilities are covered in this Guide
This Standard is a building block towards SEMI E10 and SEMI E79 by providing accurate equipment information required for SEMI E10 and SEMI E79 metrics
Data obtained using Test Method A may not agree with data obtained using Test Method B
M01400 - SEMI M14 - 半絶縁ガリウムヒ素単結晶のためのイオン注入及び活性化プロセス（仕様） StdPbc-0422 範圍（第2節）NOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI GaAs ASTMSEMI GaAs 21012 cm2Si29150KeV1001101113 2850C10 ASTMCV Referenced SEMI Standards None.
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