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F07400 - SEMI F74 - ガス供給システムに使用されるメタルシール設計の性能と評価のためのテスト方法 Revision:SEMI F74-1103 (Reapproved 0710) - Inactive manufacturing

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Description

manufacturing

SEMI D75-0524 (technical revision)

for the deposition of titanium nitride layers by atomic layer deposition or chemical vapor deposition

SEMI E142-0921 (technical revision)

The purposes of this Document are (1) to set a maximum permissible particle concentration for grade 20/0

F07400 - SEMI F74 - ガス供給システムに使用されるメタルシール設計の性能と評価のためのテスト方法 Revision:SEMI F74-1103 (Reapproved 0710) - Inactive manufacturingReferenced SEMI Standards SEMI E49 Guide for High Purity and Ultrahigh Purity Piping Performance Subassemblies, and Final Assemblies SEMI F1 Specification for Leak Integrity of High Purity Gas Piping Systems and Components

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