MF118800 - SEMI MF1188 - Test Method for Interstitial Oxygen Content of Silicon by Infrared Absorption With Short Baseline StdPbc-1113 Note: This Standard has been

Note: This Standard has been purposely restricted to 100 mm (4 in

99% Quality (Provisional)

SEMI D22-0999 (first published)

SEMI G38-0996 (Reapproved 0811)

The primary purpose of this Safety Guideline is to define a consistent means of risk estimation which can be invoked by other SEMI Safety Guidelines

MF118800 - SEMI MF1188 - Test Method for Interstitial Oxygen Content of Silicon by Infrared Absorption With Short Baseline StdPbc-1113 Note: This Standard has beenThis Test Method covers the determination of the interstitial oxygen content of single crystal silicon by measurement of an infrared absorption band at room temperature, using a short baseline drawn between 1040 cm1 and 1160 cm1 to reduce the uncertainties due to perturbations in the IR absorption at the end point regions of longer baselines that arise from effects other than absorption by interstitial oxygen. Use of the short baseline results in