M06300 - SEMI M63 - Test Method for Measuring the Al Fraction in AlGaAs on GaAs Substrates by High Resolution X-Ray Diffraction StdPbc-0423 SEMI M59 — Terminology of

SEMI M59 — Terminology of Silicon Technology (Reapprpved2000)

The grid described is referenced to the center of the wafer

1-0302 (technical revision)

緊急應變（第9節）

Fab Facilities) and final manufacturing (Test

M06300 - SEMI M63 - Test Method for Measuring the Al Fraction in AlGaAs on GaAs Substrates by High Resolution X-Ray Diffraction StdPbc-0423 SEMI M59 — Terminology ofThis Test Method describes the use of high resolution X ray diffraction (HRXRD) as a means of measuring the Al fraction in an AlGaAs epilayer on GaAs substrates, by defining the experimental method and explaining the analysis. This Test Method addresses measurement of the composition of unrelaxed, undoped AlGaAs epilayers on <001> oriented GaAs substrates. Principles are given for a standardized measurement method. There are differing parameters for