MF008100 - SEMI MF81 - Test Method for Measuring Radial Resistivity Variation on Silicon Wafers Revision:SEMI MF81-1105 - Superseded The standard is limited to

The standard is limited to modules which accommodate wafer sizes from 100 mm up to and including 200 mm in diameter

1) for the measurement of contamination on the wafer surface

SEMI E63-0999 (technical revision)

This Standard does not preclude the use of Criterion-Referenced Instruction (CRI)

it is assumed that the marking symbol will be obtained by laser marking individual dots

MF008100 - SEMI MF81 - Test Method for Measuring Radial Resistivity Variation on Silicon Wafers Revision:SEMI MF81-1105 - Superseded The standard is limited toThe radial resistivity variation of bulk semiconductor material is an important materials acceptance requirement for semiconductor device fabrication and is also used for quality control purposes. The four point probe method provides a test that requires little specimen preparation and that is nondestructive in that the wafer is left intact. The method can be applied to wafers using the resistivity measuring apparatus and procedures of SEMI MF84 if