P04100 - SEMI P41 - Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools Revision:SEMI P41-0304E - Inactive SEMI E142-0211 (designation update)

SEMI E142-0211 (designation update)

This Specification is a guideline for high volume production of leadframes

This Specification covers the characteristics specific to attenuated phase shift masks and mask blanks

SEMI M13 — Specification for Alphanumeric Marking of Silicon Wafers

SEMI M77-1015 (technical revision)

P04100 - SEMI P41 - Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools Revision:SEMI P41-0304E - Inactive SEMI E142-0211 (designation update)This specification was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on January 9, 2004. Initially available at www. semi. org February 2004; to be published March 2004. E This standard was modified in September 2004 to correct editorial errors. Changes were made to Tables 2 and 3. NOTICE: