MF152900 - SEMI MF1529 - Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure StdPbc-1123 The purpose of this Standard

The purpose of this Standard is to standardize requirements for n-methyl 2-pyrrolidone used in the semiconductor industry and testing procedures to support those specifications

The specification defined by this Standard is applicable to the case for containing substrate materials used in FPD mask manufacturing process

Flow Curve

It defines the view of the equipment through the SECS communication link

This Document also provides guidance for choosing appropriate sealing materials by understanding their diverse chemical and physical properties for various process applications in order to reduce cost of ownership and improve uptime of the process equipment in which seals are incorporated

MF152900 - SEMI MF1529 - Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure StdPbc-1123 The purpose of this StandardThe sheet resistance of epitaxial, implanted, diffused or deposited films is an important materials acceptance and process control parameter. The uniformity across a wafer of the sheet resistance resulting from any of these processes is important for the equivalence of performance of devices or circuits made from various regions of the wafer. This Test Method uses a four point probe in a manner different from that of other ASTM methods for the