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P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates StdPbc-0426 SEMI D67 — Test Methods

SKU: 77198408896
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Description

SEMI D67 — Test Methods for Antifouling Property and Chemical Resistance of FPD Polarizing Films and its Materials

本仕様書は,ポリマー材料およびポリマー製部品の性能および妥当性に焦点を当てている。ポリマー材料およびポリマー製部品が本書の意図を満たすようにするための動作要求条件は,必要に応じて示されている。要約の一覧は以下のとおりである。

Consistent preform quality enhances moldability and finished product reliability

The edges of circular wafers of electronic materials are frequently required to be shaped after cutting the wafers from the ingot

SEMI F31-0313 (technical revision)

P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates StdPbc-0426 SEMI D67 — Test MethodsNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. NOTICE: This Document was completely rewritten in 2008. This Specification covers the general requirements of the glass substrate for hard surface photomasks. This Document covers square photomasks up to 7 inches in length.

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