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SEMI E121 — Guide for Style and Usage of XML for Semiconductor Manufacturing Applications
キネマティックカプリングピンと結合し10 mmのリードイン（自動求心）を確保する機構 (3)
poly-Si or low temperature oxide (LTO)
It is expected that this Test Method will be used to validate moisture standards before they are first placed in use
SEMI S1-0701E (editorial revision)
P04500 - SEMI P45 - Specification for Job Deck Data Format for Mask Tools Revision:SEMI P45-0421 - Current SEMI E121 — Guide forThis Document defines the common job deck data format specifications for mask tools, namely MALY. MALY specification applies to the input data format for mask tools. Referenced SEMI Standards (purchase separately) SEMI P39 Specification for OASIS Open Artwork System Interchange Standard SEMI P44 Specification for Open Artwork System Interchange Standard (OASIS) Specific to Mask Tools Revision History SEMI P45 0421 (technical revision) SEMI P45 1218
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