M07700 - SEMI M77 - ロールオフ量（ROA）を使ってウェーハのエッジ近傍形状を決定するための作業方法 Revision:SEMI M77-1110 - Superseded suggestions

Name: M07700 - SEMI M77 - ロールオフ量（ROA）を使ってウェーハのエッジ近傍形状を決定するための作業方法 Revision:SEMI M77-1110 - Superseded suggestions
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Description

suggestions

SEMI E54-96 (first published)

SEMI M23-0703 (designation update)

originally published in 1991

Each of these layers has various properties which may need to be specified

M07700 - SEMI M77 - ロールオフ量（ROA）を使ってウェーハのエッジ近傍形状を決定するための作業方法 Revision:SEMI M77-1110 - Superseded suggestionsglobal Silicon Wafer Committee2010827global Audits and Reviews Subcommittee201010www. semi. org ROARoll Off Amount Referenced SEMI Standards SEMI M1 Specifications for Polished Single Crystal Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M59 Terminology for Silicon Technology

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