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F05800 - SEMI F58 - Test Method for Determination of Moisture Dry-Down Characteristics of Surface-Mounted and Conventional Gas Delivery Systems by Atmospheric Pressure Ionization Mass Spectrometry (APIMS) Revision:SEMI F58-0708 - Inactive cleaved wafers can be accepted

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Description

cleaved wafers can be accepted as long as it does not cause a significant drop in the sensitivity (from a quarter to a half of a wafer)

This Specification covers requirements

This test method was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee

The test may also be used for off-line characterization of Si wafers provided the requirements of the test method are met

This Guide defines standardized positions for measuring diameter of circular wafers of silicon and other semiconducting materials especially those processed with edge-follower edge-rounding equipment that contain flats or notches (fiducials) on the periphery

F05800 - SEMI F58 - Test Method for Determination of Moisture Dry-Down Characteristics of Surface-Mounted and Conventional Gas Delivery Systems by Atmospheric Pressure Ionization Mass Spectrometry (APIMS) Revision:SEMI F58-0708 - Inactive cleaved wafers can be acceptedThis standard was technically approved by the global Gases Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 13, 2008. It was available at www. semi. org in June 2008. Originally published October 2000. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from

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