C06400 - SEMI C64 - SEMI Statistical Guidelines for Ship To Control Revision:SEMI C64-0308 - Superseded SEMI E40— Standard for Processing

SEMI E40— Standard for Processing Management

• Film deposition equipment (chemical vapor deposition [CVD] and physical vapor deposition [PVD])

E This standard was editorially modified in October 2009 to correct editorial errors

2水素ガスの最大許容パーティクル濃度を設定すること(2)その確認のための基準方法を記述することである。

Repeatability

C06400 - SEMI C64 - SEMI Statistical Guidelines for Ship To Control Revision:SEMI C64-0308 - Superseded SEMI E40— Standard for ProcessingTo provide a set of guidelines for the quantitative determination of statistically derived limits from process data for the purpose of defining and maintaining ship to control (STC) limits. This Guide applies to specified properties of specific products for which it is desired to use statistically derived control limits upon which customer notification, negotiated disposition of product, or statistical specifications can be based. Referenced SEMI