M07000 - SEMI M70 - パーシャルサイト平坦度を使ってウェーハのエッジ近傍形状を決定するための作業方法 StdPbc-0925 This Test Method is applicable

This Test Method is applicable for carbon content between 1 × 1013 cm−3 and the solubility limit (>1 × 1016 cm−3)

This Guide applies to chemical blending equipment used within a semiconductor manufacturing facility for the purposes of producing chemicals used for wafer processing

This report tracks more than 400 power device related facilities and over 500 compound related facilities worldwide including more than 45 new facilities and lines to start production in 2018 or later

SEMI D9-0303 (Reapproved 0515)

1-96E (editorial revision)

M07000 - SEMI M70 - パーシャルサイト平坦度を使ってウェーハのエッジ近傍形状を決定するための作業方法 StdPbc-0925 This Test Method is applicableglobal Silicon Wafer Committee200994global Audits and Reviews Subcommittee200910www. semi. org200911CD ROM20073200811 PSFQR PSFQD ZDDESFQRROA Referenced SEMI Standards SEMI M1 Specifications for Polished Single Crystal Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M49 Guide for Specifying Geometry Measurement Systems for Silicon Wafers for the 130 nm to 22 nm Technology Generation