E12900 - SEMI E129 - Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility StdPbc-1225 and mechanical properties of FPD

and mechanical properties of FPD substrates

With increased levels of integration

SEMI M1 — Specification for Polished Single Crystal Silicon Wafers

This Specification defines a method for organizing and preprocessing factory data to support the detection and reduction of product time waste for a product unit during its time in the factory

SEMI E64 — Specification for 300 mm Cart to SEMI E15

E12900 - SEMI E129 - Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility StdPbc-1225 and mechanical properties of FPDThe purpose of this Guide is to minimize the negative impact on productivity caused by static charge and electric fields in semiconductor manufacturing environments. It is a guide for establishing electrostatic compatibility in facilities used for semiconductor manufacturing. Electrostatic compatibility of production equipment is addressed in SEMI E78. Electrostatic surface charge causes a number of undesirable effects in semiconductor manufacturing