MF057600 - SEMI MF576 - Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry Revision:SEMI MF576-0812 (Reapproved 0718) - Superseded SEMI MF978 — Test Method

SEMI MF978 — Test Method for Characterizing Semiconductor Deep Levels by Transient Capacitance Techniques

1  This Standard is applicable to large screen flat panel display such as non-portable TV and monitor in a dark room

This Practice does not itself contain details on performing any specific measurement

and components that were tested or certified under the previous version of this Specification

• Polycrystalline silicon (refer to SEMI M16 or JEITA EM-3601A)

MF057600 - SEMI MF576 - Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry Revision:SEMI MF576-0812 (Reapproved 0718) - Superseded SEMI MF978 — Test MethodThis Test Method covers the measurement by ellipsometry of the thickness and refractive index of an insulator grown or deposited on a silicon substrate. This Test Method uses monochromatic light. This Test Method is nondestructive and may be used to measure the thickness and refractive index of any film not absorbing light at the measurement wavelength on any substrate (1) not transparent to light at the measurement wavelength, and (2) of a material