MF067200 - SEMI MF672 - Guide for Measuring Resistivity Profiles Perpendicular to the Surface of a Silicon Wafer Using a Spreading Resistance Probe StdPbc-1016 SEMI D9-0303 (Reapproved 0515)

SEMI D9-0303 (Reapproved 0515)

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SEMI E10-0422 (technical revision)

또한 데이터 수집 계획이 어떠한 형태를 가지는지

SEMI M31-0307 (technical revision)

MF067200 - SEMI MF672 - Guide for Measuring Resistivity Profiles Perpendicular to the Surface of a Silicon Wafer Using a Spreading Resistance Probe StdPbc-1016 SEMI D9-0303 (Reapproved 0515)This Guide covers procedures for measurement of the resistivity profile perpendicular to the surface of a silicon wafer of known orientation and type in any resistivity range for which there exist suitable standards. Polished, lapped, or ground surfaces may be used. The procedures of this Guide can be used to profile through p n junctions. The procedures of this Guide may be used on epitaxial films, substrates, diffused layers, or ion implanted