C05300 - SEMI C53 - ジメチルスルホキシド（DMSO）[グレード1および2]の仕様 Revision:SEMI C53-0704 (Reapproved 0312) - Inactive which is used in the

which is used in the semiconductor industry for the deposition of aluminium metal by vapor deposition techniques and aluminium oxide based layers by atomic layer deposition

3 and ¶ 6

This Guide applies to advanced semiconductor facilities requiring control of the UPW particles from 5 to 15　nm

org September 1998

if not all

C05300 - SEMI C53 - ジメチルスルホキシド（DMSO）[グレード1および2]の仕様 Revision:SEMI C53-0704 (Reapproved 0312) - Inactive which is used in theNotice: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI DMSO Referenced SEMI Standards SEMI C1 Guide for the Analysis of Liquid Chemicals