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the openings of the glass substrate may be intended to be further processed with metal fillings
1 The purpose of this Standard is to standardize requirements for nitric acid used in the semiconductor industry and testing procedures to support those standards
SEMI C71-0611 (first published)
org in May 2015
これらの用語は，主にFPDを製造するのに使用するフォトマスクに適用される。
C00318 - SEMI C3.18 - Specification for Dichlorosilane (SiH2Cl2) in Cylinders, 97% Quality StdVol-Equipment Automation Hardware the openings of the glassNOTICE: This document was replaced by SEMI C56 in 2005. The purpose of this document is to provide a specification for Dichlorosilane (SiH2Cl2) used in the semiconductor industry. This document covers requirements for Dichlorosilane (SiH2Cl2) used in the semiconductor industry. If analytical methods are not complete, the requirements are presented as a guideline. Referenced SEMI Standards None.
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